While the conventional photomask technique gives only two-dimensional anisotropies, in this study we fabricated microstructured polymer surfaces with a selective three-dimensional anisotropy. With the applied removable mesh, we were able to confine the contacting area between the surface and photoinitiator and provide three-dimensional wettability anisotropies. Different types of meshes were used depending on the desired micropatterns shape, size and substrate material. The results revealed the three-dimensional anisotropic micropits pattern with depth profiles, which would be applicable for the confinement and patterning of cells and biomolecules. In addition, the proposed method is applicable for creating selectively activated polymer surface as a substrate for further atomic layer deposition. Moreover, we demonstrate a low cost and fast mass productive method for patterning a viscous polymer liquid in a micro-sized scale. (C) 2014 Elsevier B.V. All rights reserved.