Journal of Electroanalytical Chemistry, Vol.412, No.1-2, 77-84, 1996
In-Situ and Real-Time Study of an Electrode Process by Differential X-Ray-Diffraction .2. Cu Underpotential Deposition on Au(111)
The underpotential deposition of Cu on Au(111) was studied with X-ray diffraction in situ and in real time. Potentiodynamic and potential step modes of deposition were used and the adlayer spacing of Cu on Au(111) was determined as a function of potential and time respectively. In the latter case, a structural transition of the Cu adlayer was observed, consistent with changing from adsorption predominantly in the atop position to three-fold hollow sites on Au(111). A conventional laboratory source of X-rays was used.
Keywords:SCANNING-TUNNELING-MICROSCOPY;QUARTZ-CRYSTAL MICROBALANCE;ABSORPTION-SPECTROSCOPY;SURFACE EXAFS;AD-ATOMS;COPPER;GOLD;INTERFACES;GOLD(111);RHEED