Two copolymer/SiO2 hybrids are prepared by growing SiO2 on the template of well -structured diblock copolymer PMMA-b-PMPS using a "grafting-to" approach. PMMA-b-PMPS is obtained by atom transfer radical polymerization (ATRP) of methyl methacrylate (PMMA) and 3-(trimethoxysilyl)propyl methacrylate (PMPS) using a brominated initiator end group termed 1H,1H,2H,2H-heptadecafluoro (F-Br) and a conventional initiator of ethyl 2-bromoisobutyrate (EBiB), respectively. The "grafting-to" approach is controlled at HCl for 24 h by hydrolysis and condensation of -Si(OCH3)(3) groups in PMPS with tetraethyl orthosilicate (TEOS) to gain both hybrids of F-PMMA-b-PMPS/SiO2 (by F-Br initiator) and E-PMMA-b-PMPS/SiO2 (by EBIB initiator). Comparatively, a little amount of fluorine content provided by F-Br is able to tighten the size of self-assembled micelles, to improve wettability and the viscoelasticity of F-PMMA-b-PMPS film due to F-Br migrating onto the film surface. Therefore, the surface of F-PMMA-b-PMPS film is sufficiently hydrophobic (99 degrees and Delta f = 2941 Hz) than E-PMMA-b-PMPS film (94 degrees and Delta f = 4820 Hz), and the viscoelasticity of the adsorbed layer for F-PMMA-b-PMPS (AD/Af = -0.112) film is much harder than E-PMMA-b-PMPS/SiO2 (Delta D/Delta f = -0.071). On the other hand, the cross-linked silica in PMMA-b-PMPS/SiO2 could also increase water contact angels of films (100-107) and decrease the water absorption (4f = 704-798 Hz). The influence on the viscoelasticity of the adsorbed layer by the fluorine group is much more obvious than the cross-linked silica, therefore F-PMMA-b-PMPS/SiO2 (AD/Af = -0.347) and F-PMMA-b-PMPS (Delta D/Delta f = -0.112) films have harder adsorbed layer than E-PMMA-b-PMPS/SiO2 (-0.071) and F-PMMA-b-PMPS films (-0.042). However, compared with a slightly improvement in thermo stability by F-Br, the cross-linked silica in PMMA-b-PMPS/SiO2 performs significantly improving thermal decomposition temperature at 300 degrees C and 350 degrees C. (C) 2014 Elsevier Inc. All rights reserved.