Thin Solid Films, Vol.570, 96-100, 2014
Photoelectron spectroscopy study of thin Ag films deposited on to amorphous In-Ga-Zn-O surface
Ag was thermally evaporated onto amorphous In-Ga-Zn-O (a-IGZO) thin film, and the Ag-thickness (<0.3 nm) dependent chemical states of the Ag-deposited a-IGZO thin-film surfaces were investigated by high-resolution X-ray photoelectron spectroscopy. As Ag layer thickness increased, Ag 3d shifted towards the lower binding energy (BE) side and In 3d developed a lower-BE component; however, O 1s, Ga 3d, and Zn 3d showed much smaller spectral feature changes than Ag 3d or In 3d. The analysis suggests that Ag atoms preferentially interact and share electrons with In atoms. The Ag 4d split feature at the valence band and the metallic states near the Fermi edge were noticeably visible when the Ag thickness was greater than 0.1 nm. (C) 2014 Elsevier B.V. All rights reserved.
Keywords:In-Ga-Zn-O;Indium-gallium-zinc oxide;Silver;Deposition;Metal contact;X-ray photoelectron spectroscopy