NiO 첨가에 따른 WO  3   의 물성

노효섭; 배인수; 정훈택; 이우선; 홍광준; 이현규; 박진성; Whyo-Sub Noh; In-Soo Bae; Hoon-Taek Chung; Woo-Sun Lee; Kwang-Joon Hong; Hyun-kyu Lee; Jin-Seong Park

Korean Journal of Materials Research, Vol.11, No.4, 272-277, April, 2001

Export Citation

NiO 첨가에 따른 WO 3 의 물성

Properties of NiO-doped WO 3

노효섭, 배인수, 정훈택¹, 이우선, 홍광준, 이현규, 박진성

조선대학교
¹동신대학교

Whyo-Sub Noh, In-Soo Bae, Hoon-Taek Chung¹, Woo-Sun Lee, Kwang-Joon Hong, Hyun-kyu Lee, and Jin-Seong Park

Chosun University, 375, Seousuk-Dong, Kwang-ju, 501-759, Korea
¹Dongshin University, 252 Daeho-Dong, Naju, 520-714, Korea

초록

WO 3 에 NiO를 첨가하여 제조한 후막형 시편의 미세구조와 전기적 성질에 대해 연구하였다. NiO 첨가에 따른 WO 3 의 결정립 성장이 억제되었고, 입도 분포도 균일하였으나 첨가량에 따른 결정립 크기 변화정도는 작았다. 산소 분압 감소로 WO 3 의 전도성은 증가하였고, NiO 첨가에 의해 고용한계 이하에서는 전도성이 증가하였고, 이상에서는 전도성이 감소하였다. 온도 증가에 따라 외인성 (extrinsic) 구간에서는 전도성 변화가 적었고, 고온의 진성 (intrinsic) 구간에서는 전도도가 급격히 증가하였으며, 이들의 중간 온도에서는 산소흡착에 따라 전도도가 감소하였다.

NiO-doped WO 3 thick films were prepared by a screen printing technique. The electrical Property and microstructure of the films were investigated with the partial pressure of oxygen and the amount of NiO. The grain size of NiO-doped WO 3 was smaller than that of undoped WO 3 but the grain sixte of 0.1, 1, 10 mol% NiO-doped WO 3 were nearly the same. The electrical conductance of the WO 3 thick films decreased with the oxygen partial pressure, and increased with the amount of NiO to the limit of solid solution. The variation of the electrical conductance with temperature is not so large in the extrinsic region, but it changed rapidly in the intrinsic region. The conductance decreased with adsorption of oxygen in the intermediate range between the extrinsic and intrinsic region.

Keywords:NiO-doped WO 3;Oxygen partial pressure;Conductance;Particle size

[References]

Yang YA, YaO JN, J. Phys. Chem. Solids, Microstructural properties of an electrochromic WO 3 thin film, 61, 647 (2000)
He JL, Chiu MC, Surf. Coat. Technol., Effect of oxygen on the electrochromism of RF reactive magnetron sputter deopited tungsten oxide, 127, 43 (2000)
Djourelov N, Gogova D, Misheva M, Thin Solid Films, 347(1-2), 302 (1999)
Antonain A, Polichetti T, Addonizio ML, Aprea S, Minarini C, Rubino A, Thin Solid Films, Structural and optical characterization of amorphous and crystalline evaporated WO 3 layers, 35, 473 (1999)
Inoue T, Ohtsuka K, Yoshida Y, Matsuura Y, Kajiyama Y, Sens. Actuators B, Metal Oxide semiconductor NO 2 sensor, 24-25, 388 (1995)
Kwak MS, Hwang JS, Park CO, Miura N, Yamazoe N, Sens. Actuators B, NOx sensing properties of BA 2 WO 3 element at elevated temperature, 56, 59 (1999)
Christensen WH, Sinha DN, Agnew SF, Sens. Actuators B, Conductivity of polystyrene film upon exposure to nitorgen dioxide; a novel NO 2 sensor, 10, 149 (1993)
Dopero LE, Ferroni M, Guidi V, Marea G, Sberveglien G, Sens. Actuators B, Preparation and micro-structural characterization of nanosized thin film of TiO 2 ?WO 3 as a novel material with high sensitivity towards NO 2, 35-36, 381 (1996)
Kpfstad P, Nonstoichiometry, 'Diffusion, and Electrical Conductivity in Binary Metal Oxide', Wiley-Interscience, p.208 (1972) (1972)
Ishihara T, Sato S, Takita Y, Sens. Actuators B, Capacitive-type sensors for the selective detection of nitrogen oxides, 24-25, 392 (1995)
Sun HT, Cantalini C, Lozzi L, Passacantando M, Santucci S, Pelino M, Thin Solid Films, 287(1-2), 258 (1996)
Tomchenko AA, Khatko VV, Emelianov IL, Sens. Actuators B, WO 3 thick-film gas sensor, 46, 8 (1998)
Wang X, Sakai G, Shimanoe K, Miura N, Yamazoe N, Sens. Actuators B, Spin-coated thin films of SiO 2 ?WO 3 composites for detection of sub-ppm NO 2, 45, 141 (1997)
Tomchenko AA, Sens. Actuators B, Structure and gas-sensitive properties of WO 3 ?BiO 2 O 3 mixed thick films, 48 (2000)
McAleer JF, Moseley PT, Norris JOW, Williams DE, J. Chem. Soc. Faraday Trans., Tin Dioxide Gas Sensors, 83, 1323 (1987)
Park JS, Kim HG, J. Am. Ceram. Soc., 71(3), 173 (1988)

[1] Yang YA, YaO JN, J. Phys. Chem. Solids, Microstructural properties of an electrochromic WO 3 thin film, 61, 647 (2000)

[2] He JL, Chiu MC, Surf. Coat. Technol., Effect of oxygen on the electrochromism of RF reactive magnetron sputter deopited tungsten oxide, 127, 43 (2000)

[3] Djourelov N, Gogova D, Misheva M, Thin Solid Films, 347(1-2), 302 (1999)

[4] Antonain A, Polichetti T, Addonizio ML, Aprea S, Minarini C, Rubino A, Thin Solid Films, Structural and optical characterization of amorphous and crystalline evaporated WO 3 layers, 35, 473 (1999)

[5] Inoue T, Ohtsuka K, Yoshida Y, Matsuura Y, Kajiyama Y, Sens. Actuators B, Metal Oxide semiconductor NO 2 sensor, 24-25, 388 (1995)

[6] Kwak MS, Hwang JS, Park CO, Miura N, Yamazoe N, Sens. Actuators B, NOx sensing properties of BA 2 WO 3 element at elevated temperature, 56, 59 (1999)

[7] Christensen WH, Sinha DN, Agnew SF, Sens. Actuators B, Conductivity of polystyrene film upon exposure to nitorgen dioxide; a novel NO 2 sensor, 10, 149 (1993)

[8] Dopero LE, Ferroni M, Guidi V, Marea G, Sberveglien G, Sens. Actuators B, Preparation and micro-structural characterization of nanosized thin film of TiO 2 ?WO 3 as a novel material with high sensitivity towards NO 2, 35-36, 381 (1996)

[9] Kpfstad P, Nonstoichiometry, 'Diffusion, and Electrical Conductivity in Binary Metal Oxide', Wiley-Interscience, p.208 (1972) (1972)

[10] Ishihara T, Sato S, Takita Y, Sens. Actuators B, Capacitive-type sensors for the selective detection of nitrogen oxides, 24-25, 392 (1995)

[11] Sun HT, Cantalini C, Lozzi L, Passacantando M, Santucci S, Pelino M, Thin Solid Films, 287(1-2), 258 (1996)

[12] Tomchenko AA, Khatko VV, Emelianov IL, Sens. Actuators B, WO 3 thick-film gas sensor, 46, 8 (1998)

[13] Wang X, Sakai G, Shimanoe K, Miura N, Yamazoe N, Sens. Actuators B, Spin-coated thin films of SiO 2 ?WO 3 composites for detection of sub-ppm NO 2, 45, 141 (1997)

[14] Tomchenko AA, Sens. Actuators B, Structure and gas-sensitive properties of WO 3 ?BiO 2 O 3 mixed thick films, 48 (2000)

[15] McAleer JF, Moseley PT, Norris JOW, Williams DE, J. Chem. Soc. Faraday Trans., Tin Dioxide Gas Sensors, 83, 1323 (1987)

[16] Park JS, Kim HG, J. Am. Ceram. Soc., 71(3), 173 (1988)