화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Korean Journal of Materials Research, Vol.10, No.1, 97-106, January, 2000
Export Citation
무전해 Co-W-P 합금 도금 층의 미세구조와 자기적 특성
Micro-Structure and Magnetic Properties of Electroless Co-W-P Alloy Deposits Formed
윤성렬, 한승희, 김창욱
  • 광운대학교 화학공학과
S.R. Yoon, S.H. Han, and C.W. Kim
  • Dept. of Chemical Engineering, Kwangwoon University, Seoul 139-701, Korea
초록
본 연구에서는 NaH 2 PO 2 H 2 O (차아인산이수소나트륨)을 환원제로 사용한 무전해 도금법을 이용하여 corning glass 2948 유리기판 위에 Co-W-P 도금층을 제조할 때, pH 및 온도에 따른 석출속도, 합금조성 및 미세구조와 자기적 특성을 고찰하였다. 무전해 Co-P 도금층은 석출전위에 따라 산성에서 석출되지 않고 알칼리성에서만 환원석출반응에 의해 형성되었으며, 석출속도는 pH와 온도가 증가할수록 상승하여 pH 10, 온도 8 0 ? C 일 때 가장 우수하였다. 자기적 특성은 pH 9, 온도 7 0 ? C 일 때 보자력 870Oe, 각형비 0.78로 가장 우수하였으며, 이때, Co-P 도금층의 인(P)의 함량은 2.54%, 두께는 0.216 μm 였다. 결정배향은 β -Co의 fcc는 발견되지 않았고, α -Co의 hcp(1010), (0002), (1011) 방향의 결정배향을 확인할 수 있었으며, (1010), (1011) 방향이 우선 배향한 것으로 보아 수평자기벡터를 형성함을 확인할 수 있었다. 무전해 Co-W-P 도금층의 경우는 자기적 특성에서 보자력은 500Oe, 각형비는 0.6 정도의 경향을 보였지만, 결정배향에 있어서는 α -Co (0002) 방향으로 우선 배향하여 수직자화벡터를 형성함을 확인할 수 있었으며, 합금조성에 있어 인(P)의 함량은 0.8 ± 0.2%로 일정하였고, W의 석출량은 Na 2 WO 4 의 농도가 증가할수록 증가하여 0.1mol/L일 때 20%이였다. 수소가스를 이용한 환원분위기에서 10 0 ? C 간격으로 1시간씩 40 0 ? C 까지 열처리에 따른 자기적 특성과 미세구조의 변화를 확인하여 본 결과 Co-W-P는 열처리에 따라 표면의 평활도는 향상되었지만, 자기적 특성과 미세구조에는 아무런 변화가 없었다.
In these respects the purpose of this research is manufacturing Co-W-P alloy thin film on the corning glass 2948 by electroless plating method using NaH 2 PO 2 H 2 O (sodium hypophosphite) as a reductant, and analyzing deposition rate, alloy composition, microstructure, and magnetic characteristics at various pH's and temperatures. For Co-P alloy thin film, the reductive deposition reaction occurred only in basic condition, not in acidic condition. The deposition rate increased as the pH and temperature increased, and the optimum condition was found at the pH of 10 and the temperature of 8 0 ? C . Also magnetic characteristics was found to be most excellent at the pH of 9 and the temperature of 7 0 ? C , resulting in the coercive force of 870Oe and the squareness of 0.78. At this condition, the contents of P was 2.54% and the thickness of the film was 0.216 μm . For crystal orientation, we could not observe fcc for β -Co. On the other hand, (1010), (0002), (1011) orientation of hcp for α -Co was observed. We could confirm the formation of longitudinal magnetization from dominant (1010) and (1011) orientation of Co-P alloy. For Co-W-P alloy thin film, coercive force was 500Oe and squareness was 0.6. For crystal orientation, (0002) orientation of α -Co was dominatly found. Then we could confirm the formation of perpendicular magnetization. The content of P was constant at 0.8 ± 0.2% and the content of W increased as the concentration of Na 2 WO 4 increased. When the concentration of Na 2 WO 4 was 0.1mol/L, the composition of W was 20%. We observed the changes of magnetic characteristics and microstructure of thin film depositions of Co-W-P by the heat treatment. For heat treatment, the temperature was increased step by step to 10 0 ? C , 20 0 ? C , 30 0 ? C , and 40 0 ? C and it took 1 hour at each step in the reductive condition of hydrogen gas. By the heat treatment, flatness of surface was improved, but there were no changes on the magnetic characteristics and the microstructures.
Keywords:magnetic memory devices;electroless plating method;coercive force;squarencess
  1. 神戶德藏, 도금기술매뉴얼, 213 (1991)
  2. Osaka T, Kasai N, Koiwa I, Goto, J. Electrochem. Soc., 130, 568 (1968)
  3. Morrison JR, Electrochem. Tech., 6, 419 (1968)
  4. Fisher RD, Chilton WH, J. Electrochem. Soc., 109, 485 (1962)
  5. Speliotis DE, et al., IEEE Trans. Magn., 2-3, 208 (1966)
  6. 鷹野 修 , 金屬表面處理, 17-8, 406 (1966)
  7. 鷹野 修, 金屬表面處理, 23-7, 406 (1972)
  8. Brenner A, Riddel GE, U.S. Pat. 2, 532, 283/ 1950 (1950)
  9. Gutzeit G, Kreig A, U.S. Pat. 2, 658, 841/ 1953 (1953)
  10. Spencer LF, Metal Finishing, 72, 35 (1974)
  11. Mallory GO, Plating, 61, 1005 (1974)
  12. Marton JP, Schlesinger M, J. Electrochem. Soc., 128, 165 (1968)
  13. Brenner A, Electrodeposition of Alloys, II, 347 (1963)
  14. Admon U, Dariel MP, Grundaum E, J. Appl. Phys., 59, 2002 (1986)
  15. Admon U, Dariel MP, Grundaum E, Lodder JC, J. Appl. Phys., 62, 1943 (1987)
  16. Safranck WH, The Properties of Electro Deposited Metals and Alloys, 77 (1986)
  17. Barness C, Technical Conference (1985)