Analysis of helium addition for enhancement of reactivity between CH4 and CO2 in atmospheric pressure plasma

Duc Ba Nguyen; Won Gyu Lee

Journal of Industrial and Engineering Chemistry, Vol.32, 187-194, December, 2015

DOI10.1016/j.jiec.2015.08.016 Export Citation

Analysis of helium addition for enhancement of reactivity between CH4 and CO2 in atmospheric pressure plasma

Duc Ba Nguyen, and Won Gyu Lee^†

Department of Chemical Engineering, Kangwon National University, Chuncheon, Kangwon 200-701, Republic of Korea

E-mail:

The plasma reaction between CH4 and CO2 was performed in a dielectric barrier discharge. The addition of helium as a dilution gas gave a significant influence on the absolute amount of reactant conversions, products, and energy efficiencies. Helium addition could increase the stability of plasma discharge and improve the power efficiency for the plasma reactivity at the same process parameters. When the amount of He addition, CH4 and CO2 conversion rates increased almost twice at 5 kVp. The linear regression model was suggested to estimate the effect of input process parameters on the reaction.

Keywords:CO2 reforming of CH4;Dielectric barrier discharge;Plasma reaction;Dry reforming;Helium concentration

[References]

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Pawelec B, Damyanova S, Arishtirova K, Fierro JLG, Petrov L, Appl. Catal. A: Gen., 323, 188 (2007)
Wang Q, Yan BH, Jin Y, Cheng Y, Plasma Chem. Plasma Process., 29(3), 217 (2009)
Snoeckx R, Zeng YX, Tu X, Bogaerts A, RSC Adv., 5, 29799 (2015)
Wang Q, Cheng Y, Jin Y, Catal. Today, 148(3-4), 275 (2009)
Tu X, Gallon HJ, Twigg MV, Gorry PA, Whitehead JC, J. Phys. D-Appl. Phys., 44, 274007 (2011)
Garcia-Dieguez M, Pieta IS, Herrera MC, Larrubia MA, Alemany LJ, J. Catal., 270(1), 136 (2010)
Luna AEC, Iriarte ME, Appl. Catal. A: Gen., 343(1-2), 10 (2008)
Shang RJ, Guo XN, Mu SF, Wang YY, Jin GQ, Kosslick H, Schulz A, Guo XY, Int. J. Hydrog. Energy, 36(8), 4900 (2011)
Tao XM, Bai MG, Li XA, Long HL, Shang SY, Yin YX, Dai XY, Prog. Energy Combust. Sci., 37(2), 113 (2011)
Danhua M, Xinbo Z, Ling HY, Joseph DY, Xin T, Plasma Sources Sci. Technol., 24, 015011 (2015)
Tao XM, Bai MG, Wu QY, Huang ZJ, Yin YX, Dai XY, Int. J. Hydrog. Energy, 34(23), 9373 (2009)
Le H, Lobban LL, Mallinson RG, Catal. Today, 89(1-2), 15 (2004)
Indarto A, Choi JW, Lee H, Song HK, Energy, 31(14), 2986 (2006)
Kim TK, Lee WG, J. Ind. Eng. Chem., 18(5), 1710 (2012)
Kundu SK, Kennedy EM, Gaikwad VV, Molloy TS, Dlugogorski BZ, Chem. Eng. J., 180, 178 (2012)
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Gallon HJ, Tu X, Whitehead JC, Plasma Process. Polym., 9, 90 (2012)
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Snoeckx R, Aerts R, Tu X, Bogaerts A, J. Phys. Chem. C, 117, 4957 (2013)
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Goujard V, Tatibouet JM, Batiot-Dupeyrat C, Plasma Chem. Plasma Process., 31(2), 315 (2011)
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Ramakers M, Michielsen I, Aerts R, Meynen V, Bogaerts A, Plasma Process. Polym., 12, 755 (2015)
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Nozaki T, Miyazaki Y, Unno Y, Okazaki K, J. Phys. D-Appl. Phys., 34, 3383 (2001)
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Bottcher A, Morgante A, Grobecker R, Greber T, Ertl G, Phys. Rev. B, 49, 10607 (1994)
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Stano M, Matejcik S, Skalny JD, Mark TD, J. Phys. B -At. Mol. Opt. Phys., 36, 261 (2003)

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