The repassivation behavior of metals or alloys after oxide film damage determines the development of local corrosion and corrosion resistance. In this work, the repassivation kinetics of 316L stainless steel (316L SS) are investigated in borate buffer solution (pH 9.1) by using the abrading electrode technique. The current densities flowing from bare 316L SS surface are measured by potentiostatic method and analyzed to characterize repassivation kinetics. The initial stages of current decay (t<500 ms) are discussed according to a film growth model, which describes the initial current transient should be divided into substrate dissolution current and passive film formation current based on Avrami kinetics. Then the two independent components are analyzed individually. The film formation rate and the thickness of film are compared in different applied potential. It is shown that anodic dissolution dominates the repassivation for a short time during the early times, and a higher applied potential will promote the anodic dissolution of metal. The film growth rate increases slightly with increasing in potential. Correspondingly, increase in applied potential from 0 V-SCE to 0.8 V-SCE results in thicker monolayer, which covers the whole bare surface at the time of theta = 1. The electric field strengths through the thin passive film could reach 3.97 x 10(6) V cm(-1). (C) 2015 Elsevier B.V. All rights reserved.