Thick titanium nitride (TiN(x); x = 0.74-1.0) plates (up to 2 mm thick) were prepared by chemical vapour deposition using TiCl4, NH3 and H-2 as source gases at a total gas pressure, P(tot), of 4 kPa, deposition temperatures, T(dep), from 1373 1873 K, and NH3/TiCl4, m(N/Ti), gas molar ratio from 0.17-1.74. The effects of deposition conditions on morphology, preferred orientation and composition of CVD-TiN(x) plates were investigated. Surface morphology changed from faceted to nodular texture with increasing m(N/Ti) and T(dep). The faceted and nodular deposits showed columnar and shell-like fracture cross-sections, respectively. The composition (x = N/Ti) increased with increasing m(N/Ti) and T(dep) below m(N/Ti) = 1.0, and was constant above m(N/Ti) = 1.0. Three kinds of preferred orientations were observed : (100) orientation-at low T(dep), (110) orientation at intermediate T(dep) and low m(N/Ti), and (111) orientation at high T(dep) and high m(N/Ti). This tendency is discussed thermodynamically, and explained as being due to changes in the degree of supersaturation in the gas phase.