This paper describes synthesis of spherical and highly mono-dispersed ceria coated silica nanoparticles of size similar to 70-80 nm for application as abrasive particles in Chemical Mechanical Planarization (CMP) process. Core silica nanoparticles were initially synthesized using micro-emulsion method. Ceria coating on these ultrafine and spherical silica nanoparticles was achieved using controlled chemical precipitation method. Study of various parameters influencing the formation of ceria coated silica nanoparticles of size less than 100 nm has been undertaken and reported. Ceria coating over silica nanoparticles was varied by controlling the reaction temperature, pH and precursor concentrations. Characterization studies using X-ray diffraction, scanning electron microscopy, transmission electron microscopy and Energy Dispersive X-ray analysis show formation of crystalline CeO2 coating of 10 nm thickness over silica with spherical morphology and particle size <100 nm. Aqueous slurry of ceria coated silica abrasive was prepared and employed for polishing of oxide and nitride films on silicon substrates. Polished films were studied using ellipsometry and an improvement in SiO2:SiN selective removal rates up to 12 was observed using 1 wt% ceria coated silica nanoparticles slurry. (C) 2015 Elsevier B.V. All rights reserved.