CdTe microcrystals encapsulated in a silica glass layer were successfully fabricated. Spherical CdTe microcrystals were prepared by laser evaporation of a CdTe target in an argon gas atmosphere. The ensuing microcrystals plus argon gas passed through a tetramethoxysilane (TMOS)+O2 plasma in which they were encapsulated in an amorphous layer, 2-2.5 nm thick. Characteristic X-rays from the surface layer were measured using an energy dispersive X-ray spectrometer equipped in a high-resolution transmission electron microscope. Measurements indicated that the glass layer consisted of silicon and oxygen, with no cadmium or tellurium included. The CdTe microcrystals fabricated with our laser evaporation system showed two specific kinds of particle : small particles (below 10 nm) and large ones (over 1 00 nm). Using precise electron-beam diffraction testing, we concluded that the large microcrystal is a single crystal with a hexagonal structure, The deposition rates and infrared transmission of silica glass prepared by TMOS or tetraethoxysilane plasma-enhanced chemical vapour deposition are also discussed. The highest deposition rate, 30 nm s-1, of silica glass can be achieved in the centre of the plasma when the input r.f. power is 150 W.