The solid-state photochemistry of L2Pt(Me)(N3) (L = PPh3, PEt3, dppe/2) have been investigated on Si (111) surfaces. Photolysis of an amorphous thin film of L2Pt(Me)(N3) results in the loss of all ligands. This occurs via a single photon process with no detectable thermally stable intermediate. The resultant films are primarily platinum metal although some phosphine-containing impurity remains. The final analysis leads to formulations of the films as Pt(dppe)0.06, Pt(PPh3)0.12 and Pt(PEt3)0.07. The thicknesses of the platinum films ranged from 150 nm to less than 25 nm. This process was shown to be compatible with standard lithography methods by the production of 3 mum wires on Si (111) by photolithography.