화학공학소재연구정보센터
Chemical Physics Letters, Vol.637, 159-163, 2015
Quasi-superhydrophobic porous silicon surface fabricated by ultrashort pulsed-laser ablation and chemical etching
A silicon surface with distinctive structures is fabricated by ultrashort pulsed-laser ablation and chemical etching with acidic fluoride solutions. The surface consists of micro/nanostructures that result in the quasi-superhydrophobicity of the silicon surface. By fine tuning a key process parameter (i.e., pulsed laser power), surfaces with different wettability are fabricated. The morphology and composition of the surfaces are characterized by scanning electron microscopy, which reveals nanopores. The contact angle of water on these surfaces was measured and found to be as high as 150 degrees at optimized parameters. This work presents a novel process of fabricating a silicon-based quasi-superhydrophobic porous surface. (C) 2015 Elsevier B.V. All rights reserved.