화학공학소재연구정보센터
Journal of Materials Science, Vol.35, No.2, 331-335, 2000
Texture instability in Ni electrodeposits applied in optical disk technology
An x-ray diffraction technique was used to assess the thermal transformation of the crystallographic texture in 300 mu m thick Ni electrodeposits applied in optical disks technology. The initially strong [100] fiber texture was transformed during annealing to [211] fiber and the temperature range for rapid changes was between 300 and 350 degrees C. A numerical analysis of texture data indicates that the grain boundaries with a low and high misorientation angle (< 30 degrees and > 45 degrees) had mobility advantage and their migration contributed to the growth of the [211] texture.