화학공학소재연구정보센터
Macromolecules, Vol.48, No.5, 1509-1517, 2015
Sub-10 nm Scale Nanostructures in Self-Organized Linear Di- and Triblock Copolymers and Miktoarm Star Copolymers Consisting of Maltoheptaose and Polystyrene
The present paper describes the sub-10 nm scale self-assembly of AB-type diblock, ABA-type triblock, and A(2)B-type miktoarm star copolymers consisting of maltoheptaose (MH: A block) and polystyrene (PS: B block). These block copolymers (BCPs) were synthesized through coupling of end-functionalized MH and PS moieties. Small-angle X-ray scattering and atomic force microscope investigations indicated self-organized cylindrical and lamellar structures in the BCP bulks and thin films with domain spacing (d) ranging from 7.65 to 10.6 nm depending on the volume fraction of MH block (phi(MH)), Flory-Huggins interaction parameter (chi), and degree of polymerization (N). The BCP architecture also governed the morphology of the BCPs, e.g. the AB-type diblock copolymer (phi(MH) = 0.42), the ABA-type triblock copolymer (phi(MH) = 0.40), and the A2B-type miktoarm star copolymer (phi(MH) = 0.45) self-organized into cylinder (d = 7.65 nm), lamellar (d = 8.41 nm), and lamellar (d = 9.21 nm) structures, respectively.