A double textured selective emitter (DTSE) solar cell was fabricated using Si wafer. The 40 x 40 mm(2) silicon substrates were textured to form a pyramid-shaped surface, and nanowires were fabricated by a metal-assisted chemical etching process using Ag nanoparticles. All surface modifications of the micro and nanostructures were done by a wet-based process. The heavily doped and shallow emitters for selective emitter solar cells were prepared through the POCl3 diffusion and a chemical etch-back process, respectively. The front and rear electrodes were prepared with a conventional screen printing method. The optical properties were enhanced through the double textured (DT) structure, and additional enhancement of the electrical properties was realized through the selective emitter concept. The DTSE solar cell achieved a higher conversion efficiency of 17.9% with improved absorption and short circuit current density compared to a DT solar cell. (c) 2015 Elsevier Ltd. All rights reserved.