Thin layers of ZnO were prepared by using a special modification of the plasma-enhanced chemical vapor deposition known as surfatron. This technique utilizes the principle of surface-wave discharge powered by microwave magnetron generator. Two types of substrate holder regimes (static and movable) were intentionally employed for the preparation of two types of surface morphologies. A series of ZnO films were yielded with thicknesses ranging from 60 nm to 1500 nm. The layers were analyzed by profilometry, scanning electron microscopy, X-ray diffraction, Raman spectroscopy, UV-light adsorption and by a number of electrochemical tests. All prepared samples were crystalline and possessing different surface morphologies. It was shown that the electrochemical response of the films was directly reflecting their surface morphology. (C) 2015 Elsevier B.V. All rights reserved.