This paper presents a characterization study of carbon thin films grown on crystalline silicon substrates using a magnetized high-frequency discharge in argon-acetylene mixture at very low pressure. Thin films with different morphological structure are obtained. Depending on the gas pressure, acetylene percentage and process time, it is possible to categorize the surface film morphology into three categories: smooth, cracked or microstructured. Moreover, when applying external magnetic field, it has been observed that depending on the substrate direction ( perpendicular or parallel) to the reactor axis, it is possible to obtain different filmmorphologies. For specific conditions, energetic argon ions are formed which lead to film surface damaging and to their inclusion when they impinge the film surface. Chemical pathways and most likely isomers that contribute to the growth are also identified and discussed. Synthesizing materials in such low pressure conditions is of particular interest for better understanding the complex phenomena taking place in the plasma such as instabilities induced by particles and infra-red spectra of carbonaceous interstellar dust. (C) 2015 Elsevier B.V. All rights reserved.