Polycrystalline Pr2NiO4+delta coatings have been deposited on alumina substrates at room temperature by RF magnetron co-sputtering from Pr and Ni metallic composite target. The mixed target's area and the sputtering conditions were optimized to reach an atomic ratio Pr/Ni of 2. A subsequent annealing, at 1050-1100 degrees C, allowed obtaining Pr2NiO4+delta phase after in situ high temperature x-ray diffraction study performed on as-deposited film. Microstructural analyses (SEM and AFM) revealed dense and rough microstructure. Normal spectral emittance measurements performed at 794 degrees C in the spectral range 400-5000 cm(-1) showed an emissivity of epsilon approximate to 0.8. (C) 2016 Elsevier B.V. All rights reserved.