A stable submicron-wide electric conductive pattern consists of silver nanopar ticles/polymer composite is established via photolithographic procedure, in. the introduction of furan-functionalized surface for the chemical anchoring of the pattern was a significant contrivance. Due to Me strong anchoring between. and the treated substrate, submicron-wide patterns stands up well against the development and annealing process. Approximately 180 nm-wide nanopattern has been achieved by the irradiation of 488 nm light. The width is well below the dimension, of the incident tight wavelength. Time dependence of the electric resistance of the composite thin film during annealing process has been. measured at 200degreesC, and an. optimum. annealing time was found. The achieved volume resistivity after the optimum annealing was evaluated, as similar to 8 x 10(-7) Ohm-cm that was determined by four-probe measurements.