Two types of photopatternable blue emitting random copolymers, poly(VK-ran-CEMA) (1) and poly(VK-ran-CEMA-ran-MAE) (2), containing UV curable cinnampy (l) over bar moieties capable of generating negative-type patterned images were synthesized and characterized. In addition, their potential possibility to be used as a photopatternable polymeric host matrix for a red phosphorescent dopant was studied by using LW-Visible absorption and PL emission spectroscopy. The value of poly(VK-ran-CEMA) (1) doped with a red phosphorescent dopant, ((bsn)(2)Ir(acac), was shifted from 343 nm of poly(VK-ran-CEMA) (1) to 610nm, with increasing the content of (bsn)(2)Ir(acac). Poly(VK-ran-CEMA-ran:-(bsn)(2)IrMAE) (3), prepared by the reaction of [(bsn)(2)IrCl](2) with poly(VK-ran-CEMA-ran-MAE) (2), exhibited lambda(max),pL at 610nm in the range of red emission. These results implied efficient energy transfer from photopatternable blue emitting random copolymers to a red phosphorescent dopant. It was also found upon LW exposure on the synthesized copolymers that negative patterned images with high resolution were produced by standard photolithographic process.