The main problem of photolithography is to overcome the diffraction limit. A possibility of overcoming this limit by the application of self-writing effects is discussed. Some of these effects are studied in the present work: the self-focusing of light in a photopolymer with a positive change of the refractive index, photo-induced transportation of nanoparticles, and the threshold of oxygen-based polymerization. The results of applications of these effects to the lithography process are shown.