Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.17, No.3, 219-222, 1998 DOI10.1023/A:1006536328606 Export Citation Electrical properties of CoSi2 precipitates in cobalt-implanted silicon : a conducting atomic force microscopy study Mao JM, Xu JB, Peng QC, Wong SP, Wilson IH Keywords:LAYERS Please enable JavaScript to view the comments powered by Disqus.
