Wettability Contrast Gravure Printing

Zhang H; Ramm A; Lim SM; Xie W; Ahn BY; Xu WC; Mahajan A; Suszynski WJ; Kim C; Lewis JA; Frisbie CD; Francis LF

Advanced Materials, Vol.27, No.45, 7420-7420, 2015

DOI10.1002/adma.201502639 Export Citation

Wettability Contrast Gravure Printing

Zhang H, Ramm A, Lim SM, Xie W, Ahn BY, Xu WC, Mahajan A, Suszynski WJ, Kim C, Lewis JA, Frisbie CD, Francis LF

Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 mu m with 1.5 mu m space are gravure printed.