Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.19, No.15, 1303-1304, 2000 DOI10.1023/A:1006701025277 Export Citation Effect of carrier gas in chemical vapor deposition of FeN film using FeCl3 Toda Y, Takahashi N, Nakamura T, Momose Y Please enable JavaScript to view the comments powered by Disqus.
