Herein, the authors demonstrate the use of step-and-repeat nanoimprint lithography for the fabrication of wafer level lens master. Thereby, the authors will focus on so far unmet needs in regard to lateral lens to lens positioning, residual layer uniformities, as well as optic axis tilt control to enable the fabrication of high-end megapixel camera modules. (C) 2010 American Vacuum Society. [DOI:10.1116/1.3518914]