화학공학소재연구정보센터
Journal of Electroanalytical Chemistry, Vol.758, 170-177, 2015
Improved electrochemical performance of boron-doped diamond electrode depending on the structure of titanium substrate
This work is focused on the role of porous titanium (Ti) substrate on the electrochemical performance of borondoped diamond (BDD) films. BDD film deposited on porous Ti substrate combines the excellent property of porous Ti and BDD film, porous Ti endows the film three-dimensional (3D) porous performance and enhances the surface area of BDD electrode. The effective electrochemical surface area of 3D-Ti/BDD electrode is 8.37 cm(2) cm(-2), 3.2 times as much as that of conventional plate BDD electrode while smaller electron transfer resistance (31.3 Omega cm(2)) for Fe(CN)(6)(3-)/Fe(CN)(6)(4-) redox couple on 3D-Ti/BDD electrode is obtained compared to 1283 Omega cm(2). 3D-Ti/BDD electrode presents higher response current and the degradation of aspirin reveals that corresponding kinetic constant for plate and 3D-Ti/BDD electrode is 0.185 h(-1) and 0367 h(-1), respectively. Moreover, porous BDD electrode owns higher stability analyzing by accelerated life tests, 25% higher than plate BDD electrode. The enhancement of electrocatalytic activity and stability is essentially attributed to porous structure of Ti substrate. (C) 2015 Elsevier B.V. All rights reserved.