Sputter deposition of the thin film memristor material, lithium niobite (LiNbO2) is performed by co-deposition from a lithium oxide (Li2O) and a niobium target. Crystalline films that are textured about the (101) orientation are produced under room temperature conditions. This material displays memristive hysteresis and exhibits XPS spectra similar to MBE and bulk grown LiNbO2. Various deposition parameters were investigated resulting in variations in the deposition rate, film crystallinity, oxygen to niobium ratio, and mean niobium oxidation state. The results of this study allow for the routine production of large area LiNbO2 films at low substrate temperature useful in hybrid-integration of memristor, optical, and energy storage applications. (C) 2016 Elsevier B.V. All rights reserved.