화학공학소재연구정보센터
Macromolecular Research, Vol.24, No.9, 847-850, September, 2016
Effect of radius of gyration on polymer deformation for thermal nanoimprint lithography
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Nano-Scale deformation of the entangled polymer chains is investigated by thermal nano-imprint lithography (T-NIL) experiment. The polystyrene films of different molecular weights with uniform thickness (~1.5 μm) are used. The experimental results show that the Rg value of a polymer chain which is affected by previous solvent state gives the lower limit of a processable pattern size in an low-pressure molding process.
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