고분자 광도파로 소자용 열경화성 Fluorinated Poly(ether ketone)의 물성 및 광학적 특성

이형종; 이명현; 오민철; 안주헌; 한선규; Hyung-Jong Lee; Myung-Hyun Lee; Min-Cheol Oh; Joo-Heon Ahn; Seon Gyu Han

Polymer(Korea), Vol.23, No.3, 393-400, May, 1999

Physical and Optical Properties of Crosslinkable Fluorinated Poly(ether ketone) for Polymeric Optical Waverguide Devices

이형종^†, 이명현, 오민철, 안주헌, 한선규

한국전자통신연구원 원천기술연구본부

Hyung-Jong Lee^†, Myung-Hyun Lee, Min-Cheol Oh, Joo-Heon Ahn, and Seon Gyu Han

Electronics and Telecommunications Research Institute, 161 Kajong-Dong, Yusong-Gu, Taejon 305-600, Kre, Korea

E-mail:

초록

고분자 광도파로 소자 제작을 위하여 열경화성 에티닐 페놀기를 가진 불소 치환 폴리에테르케톤 (FPEK-EP)을 합성하였다. 합성된 고분자의 분자량과 분자량 분포는 각각 M_n=6700 g/mol과 M_w/M_n=1.76이다. 레다-데의 경화 특서을 FT-IR 및 DSC로 관찰하였다. 회전도포와 250 ℃에서 2시간 동안의 열경화에 의해 얻어진 필름은 우수한 내화학성과 480 ℃까지의 높은 열안정서을 보여주었다. 경화온도에 따른 굴절률 및 복굴절 변화를 측정하였으며, 단일모드 광도파로를 제작하여 측정한 광도파손실은 1.55 ㎛의 파장에서 0.5 dB/cm이하였다.

Fluorinated poly (ether ketone) bearing crosslinkable ethynyl group(FPEK-EP) has been investigated for low-loss polymeric optical waverguide devices. The molecular weight(Mn) and polydispersity of the polymer are determined as 6700 g/mol and and 1.76, respectively. Using a FT-IR and a DSC, curing properties of FPEK-EP are investigated. The film obtained by spin coating and then followed by thermal crosslinking at 250 ℃ for 2 h shows a good chemical resistance and a high thermal stability up to 480 ℃ under nitrogen. For the various curing conditions, the refractive indices and birefringence of the films are measured. The propagation loss of the single-mode channel waveguide is estimated to be less than 0.5 dB/cm at 1.55 ㎛.

Keywords:fluorinated poly(ether ketone);ethynyl phenol;polymeric optical waveguide

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[1] Borella MS, Jue JP, Banerjee D, Ramamurthy B, Mukherjee B, Proceedings IEEE, 85(8), 1274 (1997)

[2] Oh MC, Lee HJ, Lee MH, Ahn JH, Han SG, Kim HG, Appl. Phys. Lett., 73(18), 2543 (1998)

[3] Ahn JH, Lee HJ, Hwang WY, Oh MC, Lee MH, Han SG, Kim HG, Yim JH, IEICE Transactions on Communications and Transactions on Electronics, E82-B(2), 406 (1999)

[4] Tacato N, Jinguji K, Yasu M, Toba H, Kawachi M, IEEE J. Lightwave Technol., 6(6), 1003 (1988)

[5] Li YP, Henry CH, IEE Proc.-Optoelectron, 143(5), 263 (1996)

[6] Yoshimura R, Hikita M, Tomaru S, Imamura S, IEEE J. Lightwave Technol., 16(6), 1030 (1998)

[7] Watanabe T, Ooba N, Hayashida S, Kurihara T, Imamura S, IEEE J. Lightwave Technol., 16(6), 1049 (1998)

[8] Kubayashi J, Matsuura T, Hida Y, Sasaki S, Maruno T, IEEE J. Lightwave Technol., 16(6), 1024 (1998)

[9] Oh MC, Lee HJ, Lee MH, Ahn JH, Han SG, IEEE Photon. Technol. Lett., 10(6), 813 (1998)

[10] Eldada L, Xu C, Stengel KMT, Shacklette LW, Yardley JT, J. Lightwave Technol., 14, 1704 (1996)

[11] Lee HJ, Lee EM, Lee MH, Oh MC, Ahn JH, Han SG, Kim HG, J. Polym. Sci. A: Polym. Chem., 36(16), 2881 (1998)

[12] Han K, Suh DH, Rhee TH, Polym. Bull., 41(4), 455 (1998)

[13] Lee HJ, Lee MH, Oh MC, Ahn JH, Han SG, J. Polym. Sci. A: Polym. Chem., to be published

[14] Babb DA, Ezzell BR, Clement KS, Richey WF, Kennedy AP, J. Polym. Sci. A: Polym. Chem., 31, 3477 (1993)

[15] Eldada L, Shacklette LW, Norwood RA, Yardley JT, Organic Thin Films for Photonics Applications, OSA Technical Digest Series, 14, 5 (1997)

[16] Goodwin AA, Mercer FW, Mckenzie MT, Macromolecules, 30(9), 2767 (1997)

[17] Fang XM, Rogers DF, Scola DA, Stevens MP, J. Polym. Sci. A: Polym. Chem., 36(3), 461 (1998)

[18] Hendricks NH, Lau KSY, Polym. Prepr., 37(1), 150 (1996)

[19] Kowalczyk TC, Kosc T, Singer KD, Cahill PA, Seager CH, Meinhardt MB, Beuhler AJ, Wargowski DA, J. Appl. Phys., 76, 2505 (1994)

[20] Teng CC, Appl. Optics, 32(7), 1051 (1993)