화학공학소재연구정보센터
Materials Chemistry and Physics, Vol.183, 131-135, 2016
On the interfacial reactions between VO2 and thin metal films
We have investigated solid-state interfacial reactions between VO2 and the metals Co, Hf, Ni, Pd, Pt and Au to establish possible criteria for whether a metal will react with VO2 or not. Thin-film metal VO2 couples were annealed for periods ranging from 45 to 60 min at temperatures in the range 400-900 degrees C, and characterized using Rutherford backscattering spectrometry and X-ray diffraction. No interfacial reactions were detected between VO2 and Co, Ni, Pd, Au and Pt, but Hf did react. Metals with a positive heat of reaction Delta H and electronegativity phi*, as defined by Miedema, greater than 4.9 V did not react with VO2 whereas Hf with phi* < 4.9 V and a negative Delta H did. This correlation between the heats of reaction and the Meidema electronegativity of metals offers an empirical criterion for predicting whether a metal will react with VO2 or not. (C) 2016 Elsevier B.V. All rights reserved.