The results of infrared absorption (-OH) experiments and nonphotochemical hale-burning experiments of aluminum-phthalocyanine-tetrasulfonate (ATP) in hyperquenched glassy films of water (HGW) are reported. Films were produced by deposition of Liquid water clusters (similar to 2 mu m), generated by a thermal spray nozzle source, onto either a sapphire or polycrystalline copper cryoplate. Deposition temperatures (T-D) in the similar to 5-150 K range were employed. T-D = 5 K films were annealed at various temperatures (T-A) up to 140 K. For each value of T-A, the infrared and hole-burning properties (zero-phonon hole width and hole growth kinetics) of the film (annealed) are identical to those of unannealed HGW formed at T-D = T-A. Thus, HGW formed at a deposition temperature of T-D’ is kinetically accessible, by annealing of HGW formed at temperatures T-D < T-D’. Dramatic irreversible manifestations of configurational relaxation in HGW are observed to onset at T-A (T-D) similar to 90 K. This configurational relaxation progresses smoothly with temperature up to 150 K (highest T-D and T-A used). Zero-phonon hole widths were usually determined for a burning and reading temperature of 5 K.