화학공학소재연구정보센터
Journal of Physical Chemistry, Vol.100, No.2, 523-531, 1996
Dissociative Multiple Ionization Following Valence and Si-2P Core-Level Photoexcitation of Hsi(CH3)(3) in the Range 38-133 eV
Dissociation processes of HSi(CH3)(3) have been investigated in the valence and Si:2p core-level excitation/ photoionization by photoelectron-photoion coincidence (PEPICO) and photoion-photoion coincidence (PIPICO) techniques together with synchrotron radiation. Various monocations of H+, H-2(+), H-3(+), CHn+ (n = 0-4), SiCHn+ (n = 0-5), SiC2Hn+ (n = 0-7), and SiC3H9+ are observed in the whole energy range. Partial ion yield and PIPICO spectra were measured as a function of the incident photon energy in the range 65-133 eV. Ab initio calculations are performed to predict the dissociation pathways and their thermochemistry and to provide estimates of the term values of the core-excited states. The variation of the dissociation pattern with the photon energy is discussed in conjunction with the relevant electronic states.