Materials Research Bulletin, Vol.94, 100-103, 2017
A rapid and convenient method for the preparation of thermochromic VO2 thin films
The annealing temperature for the preparation of VO2 films with sputtering method have always been applied in the range of 300-500 degrees C. Herein, a simple and efficient route has been developed for the preparation of VO2 thin films through the thermal oxidation of sputtered vanadium film at 585 degrees C. Structural, morphological, elemental analysis and thermochromic properties of synthesized VO2 films are reported. Different from the traditional sputtered VO2 films, large change of transmittance has been found in the visible region during phase transition. The present work shows the feasibility to fabricate reliably reproduced high quality VO2 films with reversible phase transition and excellent optical modulation both in the visible and near-infrared region. (C) 2017 Published by Elsevier Ltd.