This study examines the effects of sputter deposition growth conditions on IrO2 thin films developed as electrode layers for Pb(ZrxTi1-x)O-3 piezoelectric Micro-Electro-Mechanical Systems applications. For IrO2 thin-film bottom electrodes sputter deposited on {100}-textured, rutile structure, TiO2 template layers, the effects of substrate temperature, Ar and O-2 flow rates, and post-deposition anneal were studied. Additionally, the impact of various IrO2/Pt bilayer structures on electrode properties were investigated. IrO2 bottom electrodes grown on 100-oriented TiO2 at 500 degrees C with an Ar flow rate of 100 sccm, O-2 flow rate of 60 sccm, and a nominal 100 nm thickness exhibited a film sheet resistance of 9.2 +/- 0.212/sq., surface roughness of 23 0.1 nm measured over a 2 mu m x 2 mu m area, and a rutile structure, preferred-{100} crystalline fiber texture normal to the substrate plane. Furnace anneal treatments on this electrode at 650 degrees C for 30 min in 3 SLM O-2 improved its sheet resistance to 7.5 0.2 St/sq., and surface roughness was 4.0 +/- 0.1 nm. Bilayers of IrO2/Pt grown on TiO2, with IrO2 and Pt thicknesses in the 0-100 nm range, were sputter deposited at 500 degrees C. The electrodes had composite sheet resistances in the range of 134 +/- 0.03 Omega/sq. to 9.92 +/- 0.25 Omega/sq., and surface roughnesses ranging from 1.5 +/- 0.1 nm to 2.0 +/- 0.1 nm for 2 mu m x 2 mu m measurement areas. Scanning Transmission Electron Microscopy verified preferred IrO2 and Pt crystalline fiber textures of {100} and {111}, respectively. Published by Elsevier B.V.