Journal of Crystal Growth, Vol.481, 29-34, 2018
Crystal growth and dislocation etch pits observation of chalcopyrite CdSiP2
CdSiP2 is the only crystal that can offer Non-critical Phase Matching (NCPM) for a 1064 nm pumped optical parametric oscillation (OPO) with idler output in the 6 mu m range. In this paper, a large, crack-free CdSiP2 single crystal measuring 18 mm in diameter and 65 mm in length was successfully grown by the Vertical Bridgman method (MVB) with an explosion-proof quartz ampoule. The results of lattice parameters, element composition and IR transmittance of the as-grown crystal characterized by X-ray diffraction (XRD), energy dispersive X-ray spectrometer (EDS) and Fourier transformation infrared spectrometer (FTIR) showed the as grown crystal crystallized well and the absorption coefficients at 4878 cm(-1) and 2500 cm(-1) were 0.14 cm(-1) and 0.06 cm(-1). Moreover, a new etchant composed of Br-2, HCl, HNO3, CH3OH and H2O (1: 800: 800: 400: 400 in volume ratio) was prepared and the dislocation etch pits on oriented faces of as-grown CdSiP2 crystal were observed for the first time. It is found the etch pits are in rectangular structure on the (1 0 1) face, but in trigonal pyramid structure on (3 1 2) face. According to the quantities of the etch pits, the average densities of dislocation were evaluated to be 2.28 x 10(5)/cm(2) and 1.4 x 10(5)/cm(2), respectively. (C) 2017 Elsevier B.V. All rights reserved.