Monovalent boron, free borylene species of the form B-R are notoriously unstable. Consequently, there are substantial gaps in the literature concerning the potential utility of those species in organic and inorganic synthesis either as ligands or as critical intermediates in reactions. We show that the relative stability of borylene complexes varies widely, depending on the electron donating ability of the R group. We find that borylenes can form, in the gas phase, weak sigma hole type interactions to saturated carbon centers and stronger dative bonds to tetravalent silicon and germanium. An insertion reaction of the form FH3M + BR : FH2MBHR competes against dative bonding, however, and the reaction is barrierless in several cases when M = Si and in a few cases when M = Ge. For M = C, the barriers are high enough to stabilize monovalent boron complexes. In each case, the barrier heights to M-H bond 'activation and BR insertion are very sensitive to the nucleophilicity of BR We confirm, at the MP2(full) and CCSD(T) levels, a substantial preference in borylenes for the singlet over the triplet state. An account is provided at the B3LYP-D3 and MP2(full) levels for the facile insertion reaction on the singlet surface when M = Si and for the stability of FH3M center dot BR type complexes and the higher barriers to insertion when M = C and Ge.