Journal of Physical Chemistry B, Vol.101, No.40, 7908-7918, 1997
Chemical Displacement of Molecules Adsorbed on Copper Surfaces - Low-Temperature Studies with Applications to Surface-Reactions
Previous experiments have demonstrated that displacement of a molecule adsorbed on a metal surface by an impinging gas-phase molecule can be quite a facile process. The generality of this process for an enthalpic driving force as small as I kcal/mol is demonstrated here using the displacement of a weakly binding alkene, cyclopentene, by a series of more strongly binding alkenes on Cu(100). Surface structure sensitivity in the process is also demonstrated by a comparison of benzene and cyclopentene coadsorption on Cu(100) and Cu(110). This work also shows the utility of conducting the displacement process below the temperature at which the displaced molecule desorbs from the multilayer so that temperature-programmed desorption can be used to quantify the surface coverage of displaced molecules. It is also shown that one can readily determine the kinetics of adsorbate bond dissociation and bond formation reactions by combining these chemical displacement measurements of surface coverage with an anneal/quench protocol, This approach is demonstrated through chemical displacement experiments that determine that the C-Br bond in vinyl bromide adsorbed on Cu(100) dissociates near 157 It and that the formation of toluene from reaction between methyl iodide and coadsorbed phenyl groups on eu(110) occurs below 160 K. The relative importance of enthalpy and entropy in chemical displacement is also discussed.
Keywords:BISMUTH-COVERED PT(111);BY-LAYER GROWTH;COMPETITIVE ADSORPTION;CO DISPLACEMENT;PHENYL GROUPS;POLYMER ADSORPTION;THERMAL-DESORPTION;CARBON-MONOXIDE;CU(100) SURFACE;METHYL RADICALS