A periodically structured surface or grating has been used to demonstrate state-of-the-art high efficiency crystalline silicon photovoltaic cells. However, until now the understanding of the complete relationship between the grating periodicity, silicon thickness, and absorption enhancement in silicon solar cell with an inverted pyramidal texture is still unclear. In this paper, we simulate front surface inverted pyramidal grating texture on 2-400-mu m thick silicon and optimize it to derive maximum photocurrent density from the cell. We identify a "one-size-fits-all" front grating period of 1000 nm that leads to maximum photo absorption of normally incident AM1.5g solar spectrum in silicon (configured with a back surface reflector) irrespective of the thickness of the crystalline silicon absorbing layer. With the identification of such universally optimized periodicity for the case of an inverted pyramidal grating texture, a common fabrication process can be designed to manufacture high-efficiency devices on crystalline silicon regardless of the wafer thickness. The measured reflectance from submicron and wavelength scale periodic textures also verifies simulation results. (C) 2017 Elsevier Ltd. All rights reserved.