We report a processing window in which transparent semicrystalline poly(ether ether ketone) (PEEK) can be produced. The transparent PEEK film reported is 100 mu m in thickness and has light transmittance of 54%; while ordinary semicrystalline PEEK him of the same thickness and degree of crystallinity, but produced outside the processing window, is virtually opaque (with the light transmittance close to 0%). First processing conditions for producing the transparent PEEK film are discussed, and second characterization of the transparent PEEK film is detailed. Results suggest that the main processing condition for developing the transparent PEEK film is forming temperature, defined as the highest temperature that the film is exposed to during thermal treatment. Using transmission electron microscopy (TEM), differential scanning calorimetry (DSC), and small-angle x-ray scattering (SAXS), we characterized morphology of the PEEK films. TEM shows that the morphology in the transparent PEEK film has a locally oriented lamellar structure, instead of the commonly observed spherulites or sheaves. DSC results suggest that the new morphology is formed in the melt with a high density of residual crystals that act as nucleating agents during the crystallization process, which is known as a self-seeding effect. SAXS spectra show that specimens with higher forming temperature produce broader diffraction peak at larger Q value that is defined as 4 pi sin theta/lambda. We conclude from the study that the light transmittance enhancement is morphology related, and can be achieved through control of processing conditions.