Przemysl Chemiczny, Vol.97, No.8, 1340-1343, 2018
Electrodeposition of chromium coatings from environmentally friendly Cr(III)-based deep eutectic solvents as the alternative to classic Cr(VI) chrome plating
Cu plates were covered with Cr from aq. solns. of CrCl3, and Me3N+CH2CH2OH (H2O content 20.3% by mass) at 35-65 degrees C and 7.2 A/dm(2) after addn. of H2O (20% by mass). The deposition rate was 1.4 um/h and cathode current yield 8-10%. The deposited Cr layer had a fine-grained uniform defect-free microstructure.