High-quality submicron pattern formation in dielectrics by lasers is challenging, in particular with regard to large areas. Self-assembly and self-organization mechanisms, which arise from the interaction of the laser photons with the material of the sample, can provide conditions for efficient micron patterning of large surface areas. This study demonstrates the formation of submicron ripples in fused silica (SiO2) by nanosecond laser irradiation, which extends the category of lasers capable of the controllable manufacturing of laser-induced surface structures (LIPSS). A newly designed layer system was deposited on the surface of samples, comprising, on top of the dielectric substrate, an interlayer, an absorber, and a confinement layer. The samples were irradiated though the dielectric substrate with single nanosecond (lambda = 1064) nm laser pulses. It was found that the period of the LIPSS can be tuned by changing the nanosecond laser energy, the confinement strength, and the laser pulse length from 5 ns to 25 ns. LIPSS with periods in the range of 400-600 nm, with a depth of up to 140 nm and with an orientation perpendicular to the polarization direction of the laser light, were found experimentally. The design of the sample finally enables an intra-pulse modification of the dielectric surface that provides temporal conditions near the dielectric substrate surface for surface plasmon polaritron (SPP) generation. The proposed mechanism of LIPSS formation thus comprises the ablation of the absorber layer and a plasma formation confined between the substrate surface and the confinement layer. This process causes a modification of the substrate surface. In consequence, temporary SPP generation occurs at the modified SiO2 surface, resulting in a lateral intensity modulation of the nanosecond laser beam within the pulse duration. This lateral intensity modulation of the laser pulse causes localized variation of the ablation, which finally results in the LIPSS found. The experimentally observed dependencies of the LIPSS period on the pulse energy, the confinement layer thickness, and the pulse length can be explained with the proposed model. The findings of this work provide a method of enabling local adjustment of the LIPSS period, which can be used in applications such as writing hierarchical structures of variable sizes.