화학공학소재연구정보센터
International Journal of Hydrogen Energy, Vol.43, No.46, 21374-21385, 2018
Study of the performance of dry methane reforming in a microchannel reactor using sputtered Ni/Al2O3 coating on stainless steel
In this study, a microchannel reactor was designed, its catalytic performance in dry methane reforming (DRM) was assessed, and the results were compared with those observed in a conventional fixed bed reactor. The catalyst was prepared in two forms, including catalyst pellets and catalyst-coated plate. The microchannel reactor had thin films of Ni/Al2O3 coated on stainless steel substrate via radio frequency (RF) magnetron sputtering method in various sputtering times. The fall-off rate of the catalyst-coated plates can be neglected after putting the plates under the high-temperature DRM reaction, due to the formation of firm active catalyst coatings. The performance of the samples was evaluated at different temperatures from 700 to 800 degrees C, at P = 1 atm, with a CH4:CO2 ratio of 1. The results of XRD showed that with increasing the sputtering time, there was an increase in crystallinity. As observed in FESEM images, the sample prepared with 5 min of sputtering was dense and uniform. The results of EDX not only proved the dispersion of the samples observed in XRD and FESEM analysis, but also verified the presence of the utilized elements. The temperature of 800 degrees C and the sample with 5 min sputtering time were selected as the optimum condition that provided the best performance. Catalytic performance was investigated in fixed bed reactor at the same GHSV; based on the results there were no significant conversions in the fixed bed reactor. The results of the stability test in the microchannel reactor showed a good performance during 30 h on stream. Therefore, Ni/Al2O3 thin films had a satisfactory performance in the designed microchannel. Our study shows that this type of reactor has many advantages in terms of performance, compactness, and economic concerns. (C) 2018 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.