In this work, we explore the impact of Zr precursor on the electrochemical and optical properties of V2O5 thin films. These films were synthesized by the combination of the sol-gel route with dip-coating deposition on the electron conducting (fluorine tin oxide; FTO) substrate. We used vanadium oxytriisopropoxide (V) - [OV(OC3H7)(3)] and zirconium isopropoxide (IV) - [Zr(OCH2CH2CH3)(4)] as precursors, isopropanol as solvent, and glacial acetic acid as a catalyst. After the deposition, the thin films were subjected to densification at 350 degrees C for 30 min. We characterized these films by electrochemical techniques (cyclic voltammetry, chronoamperometry and chronocoulometry) and we obtained the best result of the load density of 109 mC.cm(-2) for V2O5 sample prepared with 5 mol% of Zr precursor; this sample also presented satisfactory responses of cyclic stability. We used atomic force microscopy (AFM), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and X-ray diffraction (XRD) to obtain morphology and crystallinity of this film. Its optical properties, we studied by UV-vis spectroscopy and the transmittance results were of 82% for the discolored and 39% for colored states, both measured at 633 nm. In summary, we show that V2O5:ZrO2 thin films have quite attractive properties for their application as a working electrode in electrochromic devices.