One of the major challenges in the field of nanotechnology is the facile and inexpensive fabrication of < 10-nm nanostructures with a defect-free and precise pattern over a large area. Nanoimprint lithography (NIL) is a nanopatterning method that allows low-cost, fast production, and large-scale fabrication, but it needs improvement with regard to achieving a high resolution over a large area, processing on soft substrates, and nanomaterial patterning. Herein, it is demonstrated 10-nm patterning on soft and hard substrates via an advanced nanoimprint process. With a 100-nm master mold, both soft and hard molds with reduced pattern sizes (50, 20, 10, and 5 nm) are first fabricated using atomic layer deposition (ALD) of Al2O3. After surface functionalization of the mold, nanoscale patterns are imprinted on both hard (Si) and soft polyethylene terephthalate substrates, which result in structures with a pattern size of 10 nm. Using a hybrid supporting layer poly(methyl methacrylate) (PMMA)/poly(vinyl alcohol) (PVA) and ion sputter etching, a well-defined and clean sub-10 nm nanostructure is achieved for the nanomaterial on the substrate after lift-off and thermal annealing processes. Using this method, a graphene nanoribbon 10 nm wide is fabricated. Our approach is suitable for the fabrication of devices and structures with a 10-nm-scale pattern over a large area.