In this study, the effects of applied current density, bath concentration and temperature on the morphology, crystal structure, lattice defects and photoelectrochemical performance of the electrodeposited hematite films were investigated using scanning electron microscopy, x-ray diffractometry, Mott-Schottky analysis, photovoltage measurement, linear sweep voltammetry and electrochemical impedance spectroscopy techniques. The results showed that increase in applied current density, decrease in bath concentration and decrease in bath temperatures result in the formation of films with finer morphology, [001] crystallographic orientation, low donor density, high photovoltage/photocurrent values, low charge transfer resistance at the film/electrolyte interface and good photoactivity for water splitting in a photoelectrochemical cell. Moreover, uniform hematite films cannot be electrodeposited at very high applied current density and from very dilute baths at very low temperatures. The best electrodeposition parameters were found to be as the applied current density of 4 mA cm(-2) and bath containing 10 mM/10 mM of FeCl3/NaF at 50 degrees C. (C) 2019 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.