One potential way to fabricate battery-on-chip is photopatterning electrochemical energy storage materials directly on electronics through lithography, but applicable materials are primarily limited to transparent photocurable resins. The transparency of the photoresist would be sacrificed after extra addition of insoluble inorganic battery materials and conductors. Given the importance of radical polymers for their appropriate solubility, optical transparency, and radical robustness, they may have potential application in on-chip energy storage, transport, and conversion devices. Herein, an anodic photoresist is proposed by modifying the MicroChem SU8 resist with a radical polymer poly(2,2,6,6-tetramethyl-4-piperidinyl-N-oxyl meth-acrylate) and an ionic conductor lithium perchlorate. It can be photopatterned on silicon wafer with 10 ym scale resolution, and it exhibits charge/discharge potentials at ca. 0.68 V versus silver chloride electrode; the coulomb efficiency is regarded as nearly equaling 100%. Although the specific capacity of the photopatterned film electrode is found to be modest, 1 x 10(-5) mA h.cm(-2), it presents 1/8 of its theoretical electron storage ability. All-solid-state half-cells with circular features 30 mu m in diameter are prepared by means of overlay exposure using the as-prepared photoresist and lithium perchlorate-modified SU8 as the anodic electrode and solid electrolyte, respectively. These results suggest a promising way of using radical polymers for the integration of electrochemical energy in microelectronics.