화학공학소재연구정보센터
Journal of the Electrochemical Society, Vol.142, No.4, 1149-1152, 1995
Monolayer Molecular Adsorption Model for Electroless Copper Plating Process
Monte Carlo simulation has been applied to the adsorption process on liquid-solid interface. A simple monolayer molecular adsorption model was proposed to analyze the electroless copper plating process and adsorption characteristics was discussed. The adsorption constant estimate based on the theoretically calculated desorption constants well reproduced the experimental values.