For the fabrication of active matrix liquid crystal displays, indium tin oxide (ITO) patterns with beveled edges are highly desirable to ensure a good step coverage of subsequent layers. We obtained ITO patterns with slopes between 3 and 70 degrees, by wet chemical etching ITO/Mo duplex films in HCI/FeCl3 solutions. The slope could be tailored by the HCl concentration, the FeCl3 concentration, and by the thickness of the Mo top layer.