Improved Within-Wafer Uniformity Modeling Through the Use of Maximum-Likelihood-Estimation of the Mean and Covariance Surfaces (Vol 143, Pg 3404, 1996)

Davis JC; Hughesoliver JM; Lu JC; Gyurcsik RS

Journal of the Electrochemical Society, Vol.143, No.12, 4129-4129, 1996

Davis JC, Hughesoliver JM, Lu JC, Gyurcsik RS